Lithography and design integration - New paradigm for the technology architecture development. - Jongwook Kye; Yuansheng Ma; Lei Yuan; Yunfei Deng; Harry J. Levinson (CICC, 2012)

How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning. - Mark O. Neisser; Ndubuisi G. Orji; Harry J. Levinson; Umberto Celano; James R. Moyne; Supika Mashiro; Dan Wilcox; Slava Libman (Computer, 2024)