Impact of Al2O3 position on performances and reliability in high-k metal gated DRAM periphery transistors. - Marc Aoulaiche; Eddy Simoen; Romain Ritzenthaler; Tom Schram; Hiroaki Arimura; Moonju Cho; Thomas Kauerauf; Guido Groeseneken; Naoto Horiguchi; Aaron Thean; Antonio Federico; Felice Crupi; et al. (ESSDERC, 2013)

Beyond-Si materials and devices for more Moore and more than Moore applications. - Nadine Collaert; AliReza Alian; Hiroaki Arimura; Geert Boccardi; Geert Eneman; Jacopo Franco; Tsvetan Ivanov; Dennis Lin; Jérôme Mitard; S. Ramesh; R. Rooyackers; Marc Schaekers; et al. (ICICDT, 2016)

Novel low thermal budget gate stack solutions for BTI reliability in future Logic Device technologies : Invited paper. - Jacopo Franco; Hiroaki Arimura; J.-F. de Marneffe; A. Vandooren; L.-Å. Ragnarsson; Zhicheng Wu; Dieter Claes; E. Dentoni Litta; N. Horiguchi; Kris Croes; Dimitri Linten; Tibor Grasser; et al. (ICICDT, 2021)

High Performance Thermally Resistant FinFETs DRAM Peripheral CMOS FinFETs with VTH Tunability for Future Memories. - Romain Ritzenthaler; Elena Capogreco; E. Dupuy; Hiroaki Arimura; J. P. Bastos; P. Favia; F. Sebaai; D. Radisic; V. T. H. Nguyen; G. Mannaert; B. T. Chan; V. Machkaoutsan; et al. (VLSI Technology and Circuits, 2022)

Demonstration of 3D sequential FD-SOI on CMOS FinFET stacking featuring low temperature Si layer transfer and top tier device fabrication with tier interconnections. - A. Vandooren; N. Parihar; Jacopo Franco; Roger Loo; Hiroaki Arimura; R. Rodriguez; F. Sebaai; S. Iacovo; Kevin Vandersmissen; W. Li; G. Mannaert; D. Radisic; et al. (VLSI Technology and Circuits, 2022)

Scaled FinFETs Connected by Using Both Wafer Sides for Routing via Buried Power Rails. - Anabela Veloso; Anne Jourdain; D. Radisic; Rongmei Chen; G. Arutchelvan; B. O'Sullivan; Hiroaki Arimura; Michele Stucchi; An De Keersgieter; M. Hosseini; T. Hopf; K. D'Have; et al. (VLSI Technology and Circuits, 2022)

Molybdenum Nitride as a Scalable and Thermally Stable pWFM for CFET. - Hiroaki Arimura; S. Brus; Jacopo Franco; Yusuke Oniki; A. Vandooren; T. Conard; B. T. Chan; B. Kannan; M. Samiee; W. Li; P. Deminskyi; E. Shero; et al. (VLSI Technology and Circuits, 2023)

Novel Low Thermal Budget CMOS RMG: Performance and Reliability Benchmark Against Conventional High Thermal Budget Gate Stack Solutions. - Jacopo Franco; Hiroaki Arimura; J.-F. de Marneffe; S. Brus; Romain Ritzenthaler; E. Dentoni Litta; Kris Croes; Ben Kaczer; N. Horiguchi (VLSI Technology and Circuits, 2023)

Side and Corner Region Non-Uniformities in Grown SiO2 and Their Implications on Current, Capacitance and Breakdown Characteristics. - J. P. Bastos; Barry J. O'Sullivan; Yusuke Higashi; Adrian Vaisman Chasin; Jacopo Franco; Hiroaki Arimura; J. Ganguly; Elena Capogreco; Alessio Spessot; N. Horiguchi (IRPS, 2024)

Vt Fine-Tuning in Multi-Vt Gate-All-Around Nanosheet nFETs Using Rare-Earth Oxide-Based Dipole-First Gate Stack Compatible with CFET Integration. - Hiroaki Arimura; Hans Mertens; Jacopo Franco; L. Lukose; W. Maqsood; S. Brus; Thomas Chiarella; A. Impagnatiello; S. Homkar; V. K. Mootheri; C. Yin; G. Alessio Verni; et al. (VLSI Technology and Circuits, 2024)

DRAM-Peri FinFET - A Thermally-Stable High-Performance Advanced CMOS RMG Platform with Mo-Based pWFM for sub-10nm DRAM. - J. Ganguly; Hiroaki Arimura; Romain Ritzenthaler; H. Bana; J. W. Maes; J. G. Lai; S. Brus; W. Maqsood; R. Sarkar; B. Kannan; Elena Capogreco; V. Machkaoutsan; et al. (VLSI Technology and Circuits, 2024)

Impact of Gate Metal Work Function on 1/f Noise in RMG MOSFETs. - R. Asanovski; Hiroaki Arimura; J. Ganguly; Pierpaolo Palestri; Alexander Grill; Ben Kaczer; Naoto Horiguchi; Luca Selmi; Jacopo Franco (IRPS, 2025)

Gate Stack Development for Next Gen High Voltage Periphery DRAM Devices. - J. P. Bastos; Jacopo Franco; Barry J. O'Sullivan; Yusuke Higashi; Adrian Chasin; J. Ganguly; Hiroaki Arimura; Alessio Spessot; M.-S. Kim; N. Horiguchi (IRPS, 2025)

TDDB Reliability Improvement of Low Thermal Budget RMG Stacks. - G. Molinaro; Hiroaki Arimura; S. Sacchi; Andrea Vici; Robin Degraeve; Ben Kaczer; Naoto Horiguchi; M. Houssa; Jacopo Franco (IRPS, 2025)