Effect of ALD Processes on Physical and Electrical Properties of HfO2 Dielectrics for the Surface Passivation of a CMOS Image Sensor Application. - Honggyun Kim; Vijay D. Chavan; Jamal Aziz; Byoungsu Ko; Jae-Sung Lee; Junsuk Rho; Tukaram D. Dongale; Kyeong-Keun Choi; Deok-Kee Kim (IEEE Access, 2022)