Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet Technologies. - Gerhard Rzepa; Markus Karner; Oskar Baumgartner; Georg Strof; Franz Schanovsky; Ferdinand Mitterbauer; Christian Kernstock; Hui-Wen Karner; Pieter Weckx; Geert Hellings; Dieter Claes; Zhicheng Wu; et al. (IRPS, 2021)