Effect of negative bias temperature instability induced by a low stress voltage on nanoscale high-k/metal gate pMOSFETs. - Seonhaeng Lee; Cheolgyu Kim; Hyeokjin Kim; Gang-Jun Kim; Ji-Hoon Seo; Donghee Son; Bongkoo Kang (Microelectron. Reliab., 2013)

Voltage dependent degradation of HfSiON/SiO2 nMOSFETs under positive bias temperature instability. - Cheolgyu Kim; Hyeokjin Kim; Bongkoo Kang (Microelectron. Reliab., 2014)

Fast and accurate method of lifetime estimation for HfSiON/SiO2 dielectric n-MOSFETs under positive bias temperature instability. - Giyoun Roh; Hyeokjin Kim; Cheolgyu Kim; Dongwoo Kim 005; Bongkoo Kang (Microelectron. Reliab., 2017)