Experimental Study on Effects of Boron Transient Enhanced Diffusion on Channel Size Dependences of Low Frequency Noise in NMOSFETs. - Shuntaro Fujii; Isao Maru; Soichi Morita; Tsutomu Miyazaki (IRPS, 2019)

Impacts of Depth and Lateral Profiles of Fluorine Atoms in Gate Oxide Films on Reliability. - Shuntaro Fujii; Shohei Hamada; Tatsushi Yagi; Isao Maru; Shogo Katsuki; Toshiro Sakamoto; Atsushi Okamoto; Soichi Morita; Tsutomu Miyazaki (IRPS, 2021)