Etching characteristics of a silicon surface induced by focused ion beam irradiation. - Noritaka Kawasegi; Noboru Morita; Shigeru Yamada; Noboru Takano; Tatsuo Oyama; Kiwamu Ashida; Jun Taniguchi; Iwao Miyamoto; Sadao Momota (Int. J. Manuf. Technol. Manag., 2006)