On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiNx/SiO2/Si fabricated by ECR-CVD. - Salvador Dueñas; Helena Castán; Héctor García; J. Barbolla; E. San Andrés; I. Mártil; G. González-Díaz (Microelectron. Reliab., 2005)

Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition. - Salvador Dueñas; Helena Castán; Héctor García; J. Barbolla; Kaupo Kukli; Jaan Aarik; Mikko Ritala; Markku Leskelä (Microelectron. Reliab., 2005)