Mechanism of pre-annealing effect on electromigration immunity of Al-Cu line. - M. K. Mazumder; S. Yamamoto; H. Maeda; J. Komori; Y. Mashiko (Microelectron. Reliab., 2001)

Time-dependent dielectric breakdown of SiO2 films in a wide electric field range. - Akinobu Teramoto; H. Umeda; K. Azamawari; Kiyoteru Kobayashi; K. Shiga; J. Komori; Y. Ohno; A. Shigetomi (Microelectron. Reliab., 2001)