Breakdown spots of ultra-thin (EOT<1.5nm) HfO2/SiO2 stacks observed with enhanced - CAFM. - X. Blasco; Montserrat Nafría; Xavier Aymerich; J. Pétry; Wilfried Vandervorst (Microelectron. Reliab., 2005)

On the data interpretation of the C-AFM measurements in the characterization of thin insulating layers. - J. Pétry; Wilfried Vandervorst; Luigi Pantisano; Robin Degraeve (Microelectron. Reliab., 2005)