Role of electron and hole trapping in the degradation and breakdown of SiO2 and HfO2 films. - David Z. Gao; Jack Strand; Al-Moatasem El-Sayed; Alexander L. Shluger; Andrea Padovani; Luca Larcher (IRPS, 2018)

Variability sources and reliability of 3D - FeFETs. - Milan Pesic; Bastien Beltrando; Andrea Padovani; Shruba Gangopadhyay; Muthukumar Kaliappan; Michael Haverty; Marco A. Villena; Enrico Piccinini; Matteo Bertocchi; Tony Chiang; Luca Larcher; Jack Strand; et al. (IRPS, 2021)

Variability and disturb sources in ferroelectric 3D NANDs and comparison to Charge-Trap equivalents. - Milan Pesic; Andrea Padovani; Tommaso Rollo; Bastien Beltrando; Jack Strand; Parnika Agrawal; Alexander L. Shluger; Luca Larcher (IMW, 2022)

Towards a Universal Model of Dielectric Breakdown. - Andrea Padovani; Paolo La Torraca; Jack Strand; Alexander L. Shluger; Valerio Milo; Luca Larcher (IRPS, 2023)