Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography. - Yuelin Du; Qiang Ma 002; Hua Song; James P. Shiely; Gerard Luk-Pat; Alexander Miloslavsky; Martin D. F. Wong (DAC, 2013)

Layout Pattern Generation and Legalization with Generative Learning Models. - Xiaopeng Zhang 009; James P. Shiely; Evangeline F. Y. Young (ICCAD, 2020)

Subresolution Assist Feature Insertion by Variational Adversarial Active Learning and Clustering with Data Point Retrieval. - Sean Shang-En Tseng; Iris Hui-Ru Jiang; James P. Shiely (DAC, 2021)

Sub-Resolution Assist Feature Generation with Reinforcement Learning and Transfer Learning. - Guan-Ting Liu; Wei-Chen Tai; Yi-Ting Lin; Iris Hui-Ru Jiang; James P. Shiely; Pu-Jen Cheng (ICCAD, 2022)