Retention Characteristics Dependent on High-κ Gate-Insulator Stack in Hf-ZnO Synaptic Thin-Film Transistors. - Gyoungyeop do; Danyoung Cha; Kunhee Tae; Nayeong Lee; Seokhyun Byun; Jeongseok Pi; Sungsik Lee (IEEE Access, 2024)