Degradation of high-K LA2O3 gate dielectrics using progressive electrical stress. - Enrique Miranda 002; Joel Molina Reyes; Y. Kim; Hiroshi Iwai (Microelectron. Reliab., 2005)

Carrier separation and Vth measurements of W-La2O3 gated MOSFET structures after electrical stress. - Joel Molina Reyes; Kuniyuki Kakushima; Parhat Ahmet; Kazuo Tsutsui; Nobuyuki Sugii; Takeo Hattori; Hiroshi Iwai (IEICE Electron. Express, 2007)

Effect of changing the material and device's properties on the performance of polysilicon-based MicroActuators. - Carlos Ramón Báez Álvarez; Mónico Linares Aranda; Wilfrido Calleja Arriaga; Joel Molina Reyes (CCE, 2013)

Non-homogeneous space mechanical strain induces asymmetrical magneto-tunneling conductance in MOSFETs. - A. Erika Pondigo de los; Edmundo A. Gutiérrez-D.; Joel Molina Reyes; Fernando Guarin (ESSDERC, 2014)

Influence of the surface roughness of the bottom electrode on the resistive-switching characteristics of Al/Al2O3/Al and Al/Al2O3/W structures fabricated on glass at 300 °C. - Joel Molina Reyes; Rene Valderrama; Carlos Zuniga; Pedro Rosales; Wilfrido Calleja Arriaga; Alfonso Torres-Jácome; Francisco Javier de la Hidalga Wade; Edmundo A. Gutiérrez-D. (Microelectron. Reliab., 2014)

A smart transduction system with PVTA compensation for sensing applications. - Luis Antonio Carrillo-Martínez; Guillermo Espinosa Flores-Verdad; Joel Molina Reyes; Berni M. Perez (MWSCAS, 2015)

Analysis of quantum conductance, read disturb and switching statistics in HfO2 RRAM using conductive AFM. - Alok Ranjan 001; Nagarajan Raghavan; Joel Molina Reyes; Sean J. O'Shea; Kalya Shubhakar; Kin Leong Pey (Microelectron. Reliab., 2016)

Understanding the Resistive Switching Phenomena of Stacked Al/Al2O3/Al Thin Films from the Dynamics of Conductive Filaments. - Joel Molina Reyes; Luis Hernández-Martínez (Complex., 2017)

Room temperature resonant tunneling in metal-insulator-insulator-insulator-semiconductor devices. - Joel Molina Reyes; H. Uribe-Vargas (DRC, 2018)

Spatio-Temporal Defect Generation Process in Irradiated HfO2 MOS Stacks: Correlated Versus Uncorrelated Mechanisms. - Fernando Leonel Aguirre; Andrea Padovani; Alok Ranjan 001; Nagarajan Raghavan; Nahuel Vega; Nahuel Muller; Sebastián Matías Pazos; Mario Debray; Joel Molina Reyes; Kin Leong Pey; Felix Palumbo (IRPS, 2019)