Ultra-thin Gate Oxide Reliability and Implications for Design (Tutorial Abstract). - John S. Suehle (ISQED, 2002)

Reverse short channel effects in high-k gated nMOSFETs. - Jin-Ping Han; Sang-Mo Koo; Eric M. Vogel; Evgeni P. Gusev; C. D'Emic; Curt A. Richter; John S. Suehle (Microelectron. Reliab., 2005)

Detailed study and projection of hard breakdown evolution in ultra-thin gate oxides. - John S. Suehle; Baozhong Zhu; Yuan Chen; Joseph B. Bernstein (Microelectron. Reliab., 2005)