High optical density and low dielectric constant black matrix containing graphene oxide and carbon black on color filters. - Thanh Son Bui; Joosung Kim; EnJu Jung; Hoang Sinh Le; Ngoc Trung Nguyen; Jin-Young Bae (Displays, 2013)

Reliability on EUV Interconnect Technology for 7nm and beyond. - Tae-Young Jeong; Miji Lee; Yunkyung Jo; Jinwoo Kim; Min Kim; Myungsoo Yeo; Jinseok Kim 005; Hyunjun Choi; Joosung Kim; Yoojin Jo; Yongsung Ji; Taiki Uemura; et al. (IRPS, 2020)

Introduction to Voltage-Ramping Wafer Level Electromigration Method and Current Exponent Correction Factor for Co-Capping Metal Lines. - Da Yong Shin; Hyunjun Choi; Joosung Kim; Myungsoo Yeo; Miji Lee; Taiki Uemura; Shin-Young Chung; Jong-Ho Lee (IRPS, 2025)