Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing. - K. L. Ng; Nian Zhan; Chi-Wah Kok; M. C. Poon; Hei Wong (Microelectron. Reliab., 2003)

Dielectric breakdown characteristics and interface trapping of hafnium oxide films. - Nian Zhan; M. C. Poon; Hei Wong; K. L. Ng; Chi-Wah Kok (Microelectron. J., 2005)

A technique for respiratory motion correction in image guided cardiac catheterisation procedures. - Andrew P. King; Redha Boubertakh; K. L. Ng; YingLiang Ma; Phani Chinchapatnam; Gang Gao; Tobias Schaeffter; David J. Hawkes; Reza Razavi; Kawal S. Rhode (Image-Guided Procedures, 2008)