A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement with Attenuated Phase Shift Mask. - Zhen Geng; Zheng Shi 002; Xiaolang Yan; Kai-sheng Luo (CAD/Graphics, 2013)

Regularized level-set-based inverse lithography algorithm for IC mask synthesis. - Zhen Geng; Zheng Shi 002; Xiaolang Yan; Kai-sheng Luo (J. Zhejiang Univ. Sci. C, 2013)

SVM based layout retargeting for fast and regularized inverse lithography. - Kai-sheng Luo; Zheng Shi 002; Xiaolang Yan; Zhen Geng (J. Zhejiang Univ. Sci. C, 2014)

Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement and Its Application. - Zhen Geng; Zheng Shi 002; Xiaolang Yan; Kai-sheng Luo; Weiwei Pan (J. Comput. Sci. Technol., 2015)