The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices. - Katrina A. Morgan; Ruomeng Huang; Stuart Pearce; C. H. De Groot (ISCAS, 2014)

Total ionizing dose response of fluorine implanted Silicon-On-Insulator buried oxide. - Kenneth Potter; Katrina A. Morgan; Chris Shaw; Peter Ashburn; William Redman-White; C. H. De Groot (Microelectron. Reliab., 2014)