iFL: An interactive environment for understanding feature implementations. - Shinpei Hayashi; Katsuyuki Sekine; Motoshi Saeki (ICSM, 2010)

Time-dependent dielectric breakdown (TDDB) distribution in n-MOSFET with HfSiON gate dielectrics under DC and AC stressing. - Izumi Hirano; Yasushi Nakasaki; Shigeto Fukatsu; Masakazu Goto; Koji Nagatomo; Seiji Inumiya; Katsuyuki Sekine; Yuichiro Mitani; Kikuo Yamabe (Microelectron. Reliab., 2013)

Highly Scalable Metal Induced Lateral Crystallization (MILC) Techniques for Vertical Si Channel in Ultra-High (> 300 Layers) 3D Flash Memory. - Noritaka Ishihara; Yusuke Shimada; Takamitsu Ochi; Satoshi Seto; Haruki Matsuo; Hiroki Yamashita; Sho Morita; Masafumi Ukishima; K. Uejima; Yusuke Arayashiki; Suzuka Kajiwara; Akiyuki Murayama; et al. (VLSI Technology and Circuits, 2023)