Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition. - Salvador Dueñas; Helena Castán; Héctor García; J. Barbolla; Kaupo Kukli; Jaan Aarik; Mikko Ritala; Markku Leskelä (Microelectron. Reliab., 2005)

Experimental observations of temperature-dependent flat band voltage transients on high-k dielectrics. - Salvador Dueñas; Helena Castán; Héctor García; L. Bailón; Kaupo Kukli; Timo Hatanpää; Mikko Ritala; Markku Leskelä (Microelectron. Reliab., 2007)

Single band electronic conduction in hafnium oxide prepared by atomic layer deposition. - Sergey Shaimeev; Vladimir Gritsenko; Kaupo Kukli; Hei Wong; Eun-Hong Lee; Chungwoo Kim (Microelectron. Reliab., 2007)

Single-parameter model for the post-breakdown conduction characteristics of HoTiOx-based MIM capacitors. - Juli Blasco; Helena Castán; Héctor García; Salvador Dueñas; Jordi Suñé; Marianna Kemell; Kaupo Kukli; Mikko Ritala; Markku Leskelä; Enrique Miranda 002 (Microelectron. Reliab., 2014)