A Systematic Study of HCI Improvement in FinFET with Source/Drain Implant and Geometry Modulation. - Rakesh Ranjan; Pavitra R. Perepa; Ki-Don Lee; Ashish Kumar Jha 005; Kartika Chandra Sahoo; Kayla N. Sanders; Robert Moeller; Prateek Sharma; Minhyo Kang; Peter Kim; Kwanjae Song; Yongwoo Jeon; et al. (IRPS, 2024)

The Impact of Silicon Concentration on the Reliability of Tungsten Silicide. - Liangshan Chen; Yinghong Zhao; Ki-Don Lee; Manisha Sharma; Joonah Yoon; Timothy Davis; Kayla N. Sanders; Myungsoo Yeo; Amado Longoria; Shou-Liang Zhang; Ju Kwang Kim; Dung Dau; et al. (IRPS, 2025)