A 0.11 mum CMOS technology featuring copper and very low k interconnects with high performance and reliability. - Yoshihiro Takao; Hiroshi Kudo; Junichi Mitani; Yoshiyuki Kotani; Satoshi Yamaguchi; Keizaburo Yoshie; Kazuo Sukegawa; Nobuhisa Naori; Satoru Asai; Michiari Kawano (Microelectron. Reliab., 2002)