Robust PEALD SiN spacer for gate first high-k metal gate integration. - D. H. Triyoso; V. Jaschke; Jeff Shu; S. Mutas; Klaus Hempel; Jamie K. Schaeffer; Markus Lenski (ICICDT, 2012)

Impact of precursors choice on characteristics of PEALD SiN for spacer applications. - Dina H. Triyoso; Klaus Hempel; Susanne Ohsiek; Jeff Shu; Jamie K. Schaeffer; Markus Lenski (ICICDT, 2013)

22FDX® fMAX Optimization through Parasitics Reduction and GM Boost. - Zhixing Zhao; Patrick James Artz; Klaus Hempel; Juergen Faul; Tianbing Chen; Richard Taylor; Jerome Mazurier; Carsten Grass; Jan Hoentschel; David Harame; Steffen Lehmann; Luca Lucci; et al. (ESSDERC, 2019)