Effects of base layer thickness on reliability of CVD Si3N4 stack gate dielectrics. - Koji Eriguchi; Yoshinao Harada; Masaaki Niwa (Microelectron. Reliab., 2001)

Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics. - Takayuki Yamada; Masaru Moriwaki; Yoshinao Harada; Shinji Fujii; Koji Eriguchi (Microelectron. Reliab., 2001)

Optimization problems for plasma-induced damage - A concept for plasma-induced damage design. - Koji Eriguchi; Yoshinori Nakakubo; Asahiko Matsuda; Masayuki Kamei; Yoshinori Takao; Kouichi Ono (ICICDT, 2012)

Atomistic simulations of plasma process-induced Si substrate damage - Effects of substrate bias-power frequency. - Asahiko Matsuda; Yoshinori Nakakubo; Yoshinori Takao; Koji Eriguchi; Kouichi Ono (ICICDT, 2013)

A new aspect of plasma-induced physical damage in three-dimensional scaled structures - Sidewall damage by stochastic straggling and sputtering. - Koji Eriguchi; Yoshinori Takao; Kouichi Ono (ICICDT, 2014)

Random telegraph noise as a new measure of plasma-induced charging damage in MOSFETs. - Masayuki Kamei; Yoshinori Takao; Koji Eriguchi; Kouichi Ono (ICICDT, 2014)

Plasma-induced photon irradiation damage on low-k dielectrics enhanced by Cu-line layout. - Taro Ikeda; Akira Tanihara; Nobuhiko Yamamoto; Shigeru Kasai; Koji Eriguchi; Kouichi Ono (ICICDT, 2015)

Surface orientation dependence of ion bombardment damage during plasma processing. - Yukimasa Okada; Koji Eriguchi; Kouichi Ono (ICICDT, 2015)

A new prediction method for ReRAM data retention statistics based on 3D filament structures. - Zhiqiang Wei 005; Koji Katayama; Shunsaku Muraoka; Ryutaro Yasuhara; Takumi Mikawa; Koji Eriguchi (IRPS, 2015)

Impacts of plasma process-induced damage on MOSFET parameter variability and reliability. - Koji Eriguchi; Kouichi Ono (Microelectron. Reliab., 2015)

Evaluation methodology for assessment of dielectric degradation and breakdown dynamics using time-dependent impedance spectroscopy (TDIS). - Tomohiro Kuyama; Keiichiro Urabe; Koji Eriguchi (IRPS, 2021)