BoxRouter 2.0: architecture and implementation of a hybrid and robust global router. - Minsik Cho; Katrina Lu; Kun Yuan 002; David Z. Pan (ICCAD, 2007)

ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction. - Minsik Cho; Kun Yuan 002; Yongchan Ban; David Z. Pan (DAC, 2008)

Double patterning lithography friendly detailed routing with redundant via consideration. - Kun Yuan 002; Katrina Lu; David Z. Pan (DAC, 2009)

ELIAD: Efficient Lithography Aware Detailed Routing Algorithm With Compact and Macro Post-OPC Printability Prediction. - Minsik Cho; Kun Yuan 002; Yongchan Ban; David Z. Pan (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2009)

BoxRouter 2.0: A hybrid and robust global router with layer assignment for routability. - Minsik Cho; Katrina Lu; Kun Yuan 002; David Z. Pan (ACM Trans. Design Autom. Electr. Syst., 2009)

A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography. - Jae-Seok Yang; Katrina Lu; Minsik Cho; Kun Yuan 002; David Z. Pan (ASP-DAC, 2010)

WISDOM: Wire spreading enhanced decomposition of masks in Double Patterning Lithography. - Kun Yuan 002; David Z. Pan (ICCAD, 2010)

Manufacturability Aware Routing in Nanometer VLSI. - David Z. Pan; Minsik Cho; Kun Yuan 002 (Found. Trends Electron. Des. Autom., 2010)

Double Patterning Layout Decomposition for Simultaneous Conflict and Stitch Minimization. - Kun Yuan 002; Jae-Seok Yang; David Z. Pan (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2010)

AENEID: a generic lithography-friendly detailed router based on post-RET data learning and hotspot detection. - Duo Ding; Jhih-Rong Gao; Kun Yuan 002; David Z. Pan (DAC, 2011)

Layout decomposition for triple patterning lithography. - Bei Yu 001; Kun Yuan 002; Boyang Zhang; Duo Ding; David Z. Pan (ICCAD, 2011)

E-beam lithography stencil planning and optimization with overlapped characters. - Kun Yuan 002; David Z. Pan (ISPD, 2011)

Dealing with IC manufacturability in extreme scaling (Embedded tutorial paper). - Bei Yu 001; Jhih-Rong Gao; Duo Ding; Yongchan Ban; Jae-Seok Yang; Kun Yuan 002; Minsik Cho; David Z. Pan (ICCAD, 2012)

E-Beam Lithography Stencil Planning and Optimization With Overlapped Characters. - Kun Yuan 002; Bei Yu 001; David Z. Pan (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2012)

E-BLOW: e-beam lithography overlapping aware stencil planning for MCC system. - Bei Yu 001; Kun Yuan 002; Jhih-Rong Gao; David Z. Pan (DAC, 2013)

Layout Decomposition for Triple Patterning Lithography. - Bei Yu 001; Kun Yuan 002; Duo Ding; David Z. Pan (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2015)

EBL Overlapping Aware Stencil Planning for MCC System. - Bei Yu 001; Kun Yuan 002; Jhih-Rong Gao; Shiyan Hu 001; David Z. Pan (ACM Trans. Design Autom. Electr. Syst., 2016)