Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography. - Kyosuke Muramatsu; Hideaki Asakura; Keijiro Suzuki; Ken Tanizawa; Munehiro Toyama; Minoru Ohtsuka; Nobuyuki Yokoyama; Kazuyuki Matsumaro; Miyoshi Seki; Keiji Koshino; Kazuhiro Ikeda; Shu Namiki; et al. (IEICE Electron. Express, 2015)