Impact of nitrogen incorporation on interface states in (100)Si/HfO2. - Y. G. Fedorenko; L. Truong; V. V. Afanasev; A. Stesmans; Z. Zhang; Stephen A. Campbell (Microelectron. Reliab., 2005)

Admittance spectroscopy of traps at the interfaces of (100)Si with Al2O3, ZrO2, and HfO2. - L. Truong; Y. G. Fedorenko; V. V. Afanasev; A. Stesmans (Microelectron. Reliab., 2005)

Extremal measures and clockwise overlays. - Hari Bercovici; W. S. Li; L. Truong (Discret. Math., 2014)