Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking. - Lars Liebmann; Jennifer Lund; Fook-Luen Heng; Ioana Graur (DAC, 2001)

Application of automated design migration to alternating phase shift mask design. - Fook-Luen Heng; Lars Liebmann; Jennifer Lund (ISPD, 2001)

TCAD development for lithography resolution enhancement. - Lars Liebmann; Scott M. Mansfield; Alfred K. Wong; Mark A. Lavin; William C. Leipold; Timothy G. Dunham (IBM J. Res. Dev., 2001)

CAD computation for manufacturability: can we save VLSI technology from itself? - Mark A. Lavin; Lars Liebmann (ICCAD, 2002)

Layout impact of resolution enhancement techniques: impediment or opportunity? - Lars Liebmann (ISPD, 2003)

Rules vs tools: what's the right way to address IC manufacturing complexity? - Louis Scheffer; Lars Liebmann; Riko Rakojcic; David White (ISPD, 2007)

Electrically driven optical proximity correction based on linear programming. - Shayak Banerjee; Praveen Elakkumanan; Lars Liebmann; Michael Orshansky (ICCAD, 2008)

Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings. - Tejas Jhaveri; Vyacheslav Rovner; Lars Liebmann; Larry T. Pileggi; Andrzej J. Strojwas; Jason Hibbeler (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2010)

A framework for double patterning-enabled design. - Rani S. Ghaida; Kanak B. Agarwal; Sani R. Nassif; Xin Yuan; Lars Liebmann; Puneet Gupta 001 (ICCAD, 2011)

Coupling timing objectives with optical proximity correction for improved timing yield. - Shayak Banerjee; Kanak B. Agarwal; Sani R. Nassif; James A. Culp; Lars Liebmann; Michael Orshansky (ISQED, 2011)

O(n) layout-coloring for multiple-patterning lithography and conflict-removal using compaction. - Rani S. Ghaida; Kanak B. Agarwal; Sani R. Nassif; Xin Yuan; Lars W. Liebmann; Puneet Gupta 001 (ICICDT, 2012)

A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial]. - Lars Liebmann; J. Andres Torres (IEEE Des. Test, 2013)

Layout Decomposition and Legalization for Double-Patterning Technology. - Rani S. Ghaida; Kanak B. Agarwal; Sani R. Nassif; Xin Yuan; Lars Liebmann; Puneet Gupta 001 (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2013)

Design and technology co-optimization near single-digit nodes. - Lars W. Liebmann; Rasit Onur Topaloglu (ICCAD, 2014)

Sub-20 nm design technology co-optimization for standard cell logic. - Kaushik Vaidyanathan; Lars Liebmann; Andrzej J. Strojwas; Larry T. Pileggi (ICCAD, 2014)

Pushing multiple patterning in sub-10nm: are we ready? - David Z. Pan; Lars Liebmann; Bei Yu 001; Xiaoqing Xu; Yibo Lin (DAC, 2015)

Standard Cell Layout Regularity and Pin Access Optimization Considering Middle-of-Line. - Wei Ye 008; Bei Yu 001; David Z. Pan; Yongchan Ban; Lars Liebmann (ACM Great Lakes Symposium on VLSI, 2015)

A Retrospective View on the Technology Evolution to Support Low Power Mobile Application. - Bipul C. Paul; Ajey P. Jacob; William Taylor; Randy W. Mann; Joseph Versaggi; Edward J. Nowak; Lars W. Liebmann (J. Low Power Electron., 2018)