Multilayer Deposition in Phase-Change Memory for Best Endurance Performance and Reduced Bit Error Rate. - Gabriele Navarro; C. Sabbione; Valentina Meli; L. E. Nistor; M. Frei; Julien Garrione; M. Tessaire; F. Fillot; Nicolas Bernier; Emmanuel Nolot; Benoit Sklénard; J. Li; et al. (IMW, 2022)

Demonstration of Conformal MoS2 on High-Aspect-Ratio Structures up to 40: 1 and Exploration of Manufacturability in a 300mm Fab for 3D NAND applications. - Hao-Ling Tang; Keith T. Wong; Minrui Yu; Jason Appell; Pei Liu; Chunyu Wong; Yi-Hsuan Sharon Hsiao; Hongwen Zhou; Luc Thomas; Lixia Rong; Lavinia Nistor; Ming-Hui Chiu; et al. (IMW, 2025)