The Use of the Manufacturing Sensitivity Model Forms to Comprehend Layout Manufacturing Robustness For Use During Device Design. - Lawrence S. Melvin III; Daniel N. Zhang; Kirk J. Strozewski; Skye Wolfer (ISQED, 2006)

Transferring Optical Proximity Correction (OPC) Effect into Optical Mode. - Jianliang Li; Qiliang Yan; Lawrence S. Melvin III (ISQED, 2007)