Single-bit failure analysis at a nanometer resolution by conductive atomic force microscopy. - Yong Jiang 003; Li-Lung Lai; Jian-Jun Zhou (Microelectron. Reliab., 2012)

The device characteristics of missing LDD implantation via nanoprobing techniques for localized failure analysis. - Li-Lung Lai; Xiaojing Wu (Microelectron. Reliab., 2015)

Applications of the pulsed current-voltage (I-V) and capacitance-voltage (C-V) techniques for high-resistive gates in MOSFETs. - Li-Lung Lai; Xiaojing Wu (Microelectron. Reliab., 2016)