High density plasma chemical vapor deposition of diamond-like carbon films. - Ana Paula Mousinho; Ronaldo Domingues Mansano; Marcos Massi; Luís da Silva Zambom (Microelectron. J., 2003)

Low-temperature deposition of silicon oxide and silicon nitride by reactive magnetron sputtering. - Luís da Silva Zambom; Ronaldo Domingues Mansano; Ana Paula Mousinho (Microelectron. J., 2009)