Oxide and interface trap densities estimation in ultrathin W/La2O3/Si MOS capacitors. - M. Mamatrishat; T. Kubota; T. Seki; Kuniyuki Kakushima; Parhat Ahmet; Kazuo Tsutsui; Yoshinori Kataoka; Akira Nishiyama; Nobuyuki Sugii; Kenji Natori; Takeo Hattori; Hiroshi Iwai (Microelectron. Reliab., 2012)