Reliability of polycrystalline silicon thin film resistors. - M. Nakabayashi; Hidenori Ohyama; Eddy Simoen; M. Ikegami; Cor Claeys; K. Kobayashi; M. Yoneoka; K. Miyahara (Microelectron. Reliab., 2001)

2 MeV electron irradiation effects on the electrical characteristics of MOS capacitors with ALD Al2O3 dielectrics of different thickness. - Joan Marc Rafí; M. B. González; Kenichiro Takakura; I. Tsunoda; M. Yoneoka; Oihane Beldarrain; Miguel Zabala; Francesca Campabadal (Microelectron. Reliab., 2013)