Investigation of Reverse Filament Formation in ITO/HfO2-based RRAM. - Karl-Magnus Persson; Mamidala Saketh Ram; Mattias Borg; Lars-Erik Wernersson (DRC, 2019)

Controlling Filament Stability in Scaled Oxides (3 nm) for High Endurance (>106) Low Voltage ITO/HfO2 RRAMs for Future 3D Integration. - Mamidala Saketh Ram; Karl-Magnus Persson; Lars-Erik Wernersson (DRC, 2021)

Read Noise Analysis in Analog Conductive-Metal-Oxide/HfOx ReRAM Devices. - Davide G. F. Lombardo; Mamidala Saketh Ram; Tommaso Stecconi; Wooseok Choi; Antonio La Porta; Donato Francesco Falcone; Bert J. Offrein; Valeria Bragaglia (DRC, 2024)