Cost-effective cleaning and high-quality thin gate oxides. - Marc M. Heyns; Twan Bearda; Ingrid Cornelissen; Stefan De Gendt; Robin Degraeve; Guido Groeseneken; Conny Kenens; D. Martin Knotter; Lee M. Loewenstein; Paul W. Mertens; Sofie Mertens; Marc Meuris; et al. (IBM J. Res. Dev., 1999)

Impact of gate oxide nitridation process on 1/f noise in 0.18 mum CMOS. - M. Da Rold; Eddy Simoen; Sofie Mertens; Marc Schaekers; G. Badenes; Stefaan Decoutere (Microelectron. Reliab., 2001)

Optimization of low temperature silicon nitride processes for improvement of device performance. - E. Sleeckx; Marc Schaekers; X. Shi; E. Kunnen; B. Degroote; M. Jurczak; Muriel de Potter de ten Broeck; E. Augendre (Microelectron. Reliab., 2005)

Beyond-Si materials and devices for more Moore and more than Moore applications. - Nadine Collaert; AliReza Alian; Hiroaki Arimura; Geert Boccardi; Geert Eneman; Jacopo Franco; Tsvetan Ivanov; Dennis Lin; Jérôme Mitard; S. Ramesh; R. Rooyackers; Marc Schaekers; et al. (ICICDT, 2016)

Study of the Mechanical Stress Impact on Silicide Contact Resistance by 4-Point Bending. - Yefan Liu; Hao Yu; Gaspard Hiblot; Anastasiia Kruv; Marc Schaekers; Naoto Horiguchi; Dimitrios Velenis; Ingrid De Wolf (IRPS, 2019)