Observation and characterization of defects in HfO2 high-K gate dielectric layers. - Vidya Kaushik; Martine Claes; Annelies Delabie; Sven Van Elshocht; Olivier Richard; Thierry Conard; Erika Rohr; Thomas Witters; Matty Caymax; Stefan De Gendt (Microelectron. Reliab., 2005)