Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing. - Kokoro Kato; Masakazu Endo; Tadao Inoue; Shigetoshi Nakatake; Masaki Yamabe; Sunao Ishihara (IEICE Trans. Fundam. Electron. Commun. Comput. Sci., 2010)