Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process. - Yoshihiko Hirai; Masaru Sasago; Masayuki Endo; Kiichiro Tsuji; Yojiro Mano (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1987)

Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system). - Yoshihiko Hirai; Sadafumi Tomida; Kazushi Ikeda; Masaru Sasago; Masayuki Endo; Sigeru Hayama; Noboru Nomura (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1991)

Configurable assembly of DNA origami on MEMS by microfluidic device. - Chunmei Huang; Takahiro Saeki; Masayuki Endo; Hiroshi Sugiyama; Chen-Hsun Weng; Gwo-Bin Lee; Koji Sugano; Toshiyuki Tsuchiya; Osamu Tabata (NEMS, 2011)

Plantar Tactile Sensation for Young Females with Hiesho. - Tianyi Wang 002; Masayuki Endo; Haruka Uehara; Sayaka Suga; Masayo Matsuzaki; Goji Nakamoto; Yuko Ohno (LifeTech, 2020)

Convolutional neural network-based computer-aided diagnosis in Hiesho (cold sensation). - Tianyi Wang 002; Masayuki Endo; Yuko Ohno; Shima Okada; Masaaki Makikawa (Comput. Biol. Medicine, 2022)