Reliability of ultrathin nitrided oxides grown in low pressure N2O ambient. - Matthias Beichele; Anton J. Bauer; Heiner Ryssel (Microelectron. Reliab., 2001)

Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode in PMOS devices. - S. Strobel; Anton J. Bauer; Matthias Beichele; Heiner Ryssel (Microelectron. Reliab., 2001)