The evolution of IBM CMOS DRAM technology. - Eric Adler; John K. DeBrosse; Stephen F. Geissler; Steven J. Holmes; Mark D. Jaffe; Jeffrey B. Johnson; Charles W. Koburger III; Jerome B. Lasky; Brian Lloyd; Glen L. Miles; James S. Nakos; Wendell P. Noble Jr.; et al. (IBM J. Res. Dev., 1995)

Plasma-etching processes for ULSI semiconductor circuits. - Michael Armacost; Peter D. Hoh; Richard Wise; Wendy Yan; Jeffrey J. Brown; John H. Keller; George A. Kaplita; Scott D. Halle; K. Paul Muller; Munir D. Naeem; Senthil Srinivasan; Hung Y. Ng; et al. (IBM J. Res. Dev., 1999)