A Practical Application of Full-Feature Alternating Phase-Shifting Technology for a Phase-Aware Standard-Cell Design Flow. - Michael Sanie; Michel Côté; Philippe Hurat; Vinod Malhotra (DAC, 2001)

New DFM Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains. - Pradiptya Ghosh; Chung-shin Kang; Michael Sanie; David Pinto 003 (ISQED, 2003)