A new method to measure the distance between graduation lines on graduated scales. - William B. Penzes; Richard A. Allen; Michael W. Cresswell; Loren W. Linholm; E. Clayton Teague (IEEE Trans. Instrum. Meas., 2000)

Application of conformal mapping approximation techniques: parallel conductors of finite dimensions. - Nadine Pesonen; Walter K. Kahn; Richard A. Allen; Michael W. Cresswell; Mona E. Zaghloul (IEEE Trans. Instrum. Meas., 2004)

Comparison of SEM and HRTEM CD Measurements Extracted From Test Structures Having Feature Linewidths From 40 to 240 nm. - Michael W. Cresswell; Richard A. Allen; William F. Guthrie; Christine E. Murabito; Ronald G. Dixson; Amy Hunt (IEEE Trans. Instrum. Meas., 2008)