The study of compensative structure assisted convex and concave corner structures etching by inductively coupled plasma-reactive ion etch (ICP-RIE). - Yu-Hsin Lin 003; Yuan-Chieh Cheng; Nien-Nan Chu; Wensyang Hsu; Yu-Hsiang Tang; Po-Li Chen; Chih-Chung Yang; Ming-Hua Hsiao; Chien-Nan Hsiao (NEMS, 2015)