Electrical characterization of HfO2 films obtained by UV assisted injection MOCVD. - J. M. Decams; H. Guillon; Carmen Jiménez; M. Audier; J. P. Sénateur; C. Dubourdieu; O. Cadix; Barry J. O'Sullivan; Mircea Modreanu; Paul K. Hurley (Microelectron. Reliab., 2005)

Post deposition UV-induced O2 annealing of HfO2 thin films. - Q. Fang; I. Liaw; Mircea Modreanu; Paul K. Hurley; I. W. Boyd (Microelectron. Reliab., 2005)

LPCVD-silicon oxynitride films: interface properties. - Elena Halova; Sashka Alexandrova; A. Szekeres; Mircea Modreanu (Microelectron. Reliab., 2005)