Lithography options for the 32nm half pitch node and beyond. - Kurt Ronse; Philippe Jansen; Roel Gronheid; Eric Hendrickx; Mireille Maenhoudt; Mieke Goethals; Geert Vandenberghe (CICC, 2008)

Lithography Options for the 32 nm Half Pitch Node and Beyond. - Kurt Ronse; Philippe Jansen; Roel Gronheid; Eric Hendrickx; Mireille Maenhoudt; Vincent Wiaux; Mieke Goethals; R. Jonckheere; Geert Vandenberghe (IEEE Trans. Circuits Syst. I Regul. Pap., 2009)

In-line metrology and inspection for process control during 3D stacking of IC's. - Sandip Halder; Ingrid De Wolf; Alain Phommahaxay; Andy Miller; Mireille Maenhoudt; Gerald Beyer; Bart Swinnen; Eric Beyne (3DIC, 2011)