Lithography at a wavelength of 193 nm. - Mordechai Rothschild; Anthony R. Forte; Roderick R. Kunz; Susan C. Palmateer; Janusz H. C. Sedlacek (IBM J. Res. Dev., 1997)

Review of technology for 157-nm lithography. - A. Keith Bates; Mordechai Rothschild; Theodore M. Bloomstein; Theodore H. Fedynyshyn; Roderick R. Kunz; Vladimir Liberman; Michael Switkes (IBM J. Res. Dev., 2001)

Deep-UV microsphere-assisted ultramicroscopy. - Kenneth W. Allen; Vladimir Liberman; Mordechai Rothschild; Nicholaos I. Limberopoulos; Dennis E. Walker; Augustine M. Urbas; Vasily N. Astratov (ICTON, 2015)