Artificial-Neural-Network-Driven Innovations in Time-Varying Process Diagnosis of Low-K Oxide Deposition. - Seunghwan Lee; Yonggyun Park; Pengzhan Liu; Muyoung Kim; Hyeong-U. Kim; Taesung Kim (Sensors, 2023)

In-situ and Non-contact Etch Depth Prediction in Plasma Etching via Machine Learning (ANN & BNN) and Digital Image Colorimetry. - Minji Kang; Seongho Kim; Eunseo Go; Donghyeon Paek; Geon Lim; Muyoung Kim; Soyeun Kim; Sung Kyu Jang; Min Sup Choi; Woo Seok Kang; Jaehyun Kim; Jaekwang Kim; et al. (CoRR, 2025)