Ultra-thin oxides on silicon fabricated using ultra-slow multicharged ion beams. - G. Borsoni; N. Béchu; M. Gros-Jean; Michael L. Korwin-Pawlowski; R. Laffitte; V. Le Roux; L. Vallier; Névine Rochat; C. Wyon (Microelectron. Reliab., 2001)